Product Details
| Product Name | Post Cu/Low-k CMP Cleaning Solution, "MCX-SDR4" |
|---|---|
| Generic Product Name | Advanced Cleaning Solutions |
| Company Name | Mitsubishi Chemical Corporation |
| Department Name | Semiconductor Materials Dept., Information & Electronics Div., Advanced Solutions |
| TEL | +81-3-6748-7168 |
| Product Information | During the post CMP cleaning process in semiconductor manufacturing, it is important to remove organic residues and particles on Cu wires and Low-k films without damaging the substrate. Our product, MCX-SDR4, is a high-efficiency cleaning solution suited for semiconductor industries. Characteristics: -High efficiency particle removal -Removes organic residues effectively -Limits galvanic corrosion on Cu wire -Limits Low-k damage -Improves Low-k wetting properties |
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Product Family (middle & small classification)
| middle classification | small classification |
|---|---|
| Specialty Chemicals | Detergents and Antifouling Agents |
| Electronic and Electrical Components and Products | Electronics Materials and Components Other Related Products for Electric and Electronic Devices |
Applications
| IT Ubiquitous network |
| Cleaning after Cu CMP (slurry polishing) process |